GLOBAL FOUNDRIES Details Advanced Technology Aimed at 22nm and Beyond- At VLSI 2009, engineers describe new technique to continue scaling in HKMG transistors – SUNNYVALE, CA and KYOTO, JAPAN – June 16, 2009 – GLOBALFOUNDRIES today described an innovative technology that could overcome one of the key hurdles to advancing high-k metal gate (HKMG) transistors, bringing the industry one step closer to the next generation of mobile devices with more computing power and vastly improved battery life. The semiconductor